Metoda depunerii chimice in stare de vapori (CVD)
Method of vapor deposition (CVD)

Summary/Abstract: Chemical Vapor Deposition or CVD is one of the most important methods for preparing thin films and coatings of various inorganic compositions. It is used extensively. CVD technology involves completing a number of steps. The CVD system consists of several components:gas delivery system; reaction chamber; loading mechanism of the substrate; energy source; vacuum system; exhaust system; treatment plant and discharge; process control equipment. Application of the method: a method of making synthetic diamonds. Amorphous carbon structure is clearly different from that of diamond-like structure. Rough amorphous carbon material is of great interest to wear layers of protection due to high hardness and low friction coefficient. Numerous efforts have been made to synthesize harsh carbon layers. Therefore, various efforts were made to search for a new phase of carbon nitride including amorphous phases. Thus, they have a potential application as a surface coating for hard disks of computers alike and as solid lubricants.

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